According to a market report by Lucintel, the future of the global metal sputtering target material market looks promising with opportunities in the semiconductor, solar energy, and flat panel display applications. The global metal sputtering target material market is expected to reach an estimated $4.7 billion by 2030 with a CAGR of 5.8% from 2024 to 2030.
The major drivers for this market are significant use of this material in the solar industry for thin-film solar cell coatings, growing demand for high-quality texture films and particles, and increasing preference for this material based 3D printing.
In this market, pure metal and alloy are the major segments of metal sputtering target material market by type.
Lucintel forecasts that pure metal will remain the larger segment due to the its substantial usage in the production of metal sputtering targets.
Within this market, flat panel display is expected to witness highest growth over the forecast period due to growing use of metal sputtering target materials in the production of glass and touch screen electrodes.

APAC is expected to witness highest growth over the forecast period due to rising sputtering target product utilization in the semiconductor and digital electronics sectors of the region.

JX Nippon Mining & Metals, Praxair, Plansee, Mitsui Mining & Smelting, Hitachi Metals, Honeywell, Sumitomo Chemical, ULVAC, Materion, and Grikin Advanced Material are the major suppliers in the metal sputtering target material market.
This unique research report will enable you to make confident business decisions in this globally competitive marketplace. For a detailed table of contents, contact Lucintel at +1-972-636-5056 or write us at [email protected]